Penetration of corrosive species into copper exposed to simulated O2-free groundwater by time-of-flight secondary ion mass spectrometry (ToF-SIMS)

ToF-SIMS analysis of copper samples after exposures to simulated groundwater with and without sulfide addition was performed investigate the penetration corrosive species containing H, S, O, Cl, into copper. Depth profiles show extent 2D/3D images reveal local elemental distribution at different depths inside Pre-oxidation did not reduce while additional in exposure 60 °C significantly promoted penetration. The demonstrates need for risk assessment complex corrosion forms such as sulfide-induced embrittlement cracking.